Tuning transport properties of nickel-doped zinc oxide for thermoelectric applications | MRS Communications | Cambridge Core
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Implementation of Ambipolar Polysilicon Thin-Film Transistors with Nickel Silicide Schottky Junctions by Low-Thermal-Budget Micr
Demonstration of tantalum as a structural material for MEMS thermal actuators | Microsystems & Nanoengineering
High-performance germanium n<sup>+</sup>/p junction by nickel-induced dopant activation of implanted phosphorus at low temperature
Coatings | Free Full-Text | Nickel Film Deposition with Varying RF Power for the Reduction of Contact Resistance in NiSi
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In-Situ Annealing Study on the Thermal Stability of Nickel Germanides
Low-Temperature Growth of Ferroelectric Hf0.5Zr0.5O2 Thin Films Assisted by Deep Ultraviolet Light Irradiation | ACS Applied Electronic Materials
Effect of Millisecond Annealing Temperature of Ni1-xPtx Si Formation on Leakage Current Characteristics of Static Random- Access Memory Cells | Semantic Scholar
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Selective Nickel Silicide Wet Etchback Chemistry for Low Temperature Anneal Process | Scientific.Net
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Realizing High Thermoelectric Performance at Ambient Temperature by Ternary Alloying in Polycrystalline Si1-x-yGexSny Thin Films with Boron Ion Implantation | Scientific Reports
Effects of RTA temperature on I -V characteristics of (a) Ohmic contact... | Download Scientific Diagram
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Low temperature Ni/Si/Al ohmic contacts to p-type 4H-SiC - ScienceDirect
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Effect of seed layers and rapid thermal annealing on the temperature coefficient of resistance of NiCr thin films - ScienceDirect
